| 摘要 |
PURPOSE: An apparatus for cleaning a mask for depositing an organic light emitting display device is provided to reduce mask cleaning time by including a processing bath to burn or dissolve organic materials. CONSTITUTION: A processing bath(10) provides an immersion space of a mask. A heater maintains the temperature of melting NaOH by heating the processing bath. An overflow bath(20) receives the overflowed melting NaOH. A circulation line circulates the melting NaOH. A load cell(21) detects the weight of the melting NaOH received in the overflow bath. [Reference numerals] (40) Control unit
|
