| 摘要 |
A cleaning apparatus of thin film deposition equipment is provided to reduce a light emitting device manufacturing time and to prevent the increase of fabrication costs by cleaning efficiently an UV(UltraViolet) transmitting window using an improved plasma inlet line structure. A cleaning apparatus of thin film deposition equipment includes a chamber(102), a thin film forming portion(106) in the chamber, a plasma inlet line. The plasma inlet line(212) is installed opposite to the thin film forming portion. The thin film forming portion is formed at a lower portion of an inner wall of the chamber. The plasma inlet line is obliquely installed at an outer wall of the chamber toward the thin film forming portion. |
