AMORPHOUS SILICON FILM FORMATION METHOD AND AMORPHOUS SILICON FILM FORMATION APPARATUS

摘要

PURPOSE: A apparatus for forming an amorphous silicon film a method thereof are provided to minutely form a contact hole and a line by improving the accuracy of surface roughness. CONSTITUTION: A base(2) of a silicon substrate(1) is heated. A seed layer(3) is formed on the surface of the base by flowing aminosilane group gas to the base. Silane gas without amino group is supplied to a seed layer on the surface of the base. The silane gas without the amino group is thermally decomposed. An amorphous silicon film(4) is formed on the seed layer.