| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique for forming an excellent film on the substrate surface, by transferring a polysilazane film formed on a carrier. <P>SOLUTION: A sheet film F carrying a thin film R coated, on the surface thereof, with a coating liquid containing a polysilazane material is placed in a processing chamber 1, which is then evacuated. While heating the sheet film F to a predetermined temperature by means of a heater 541, a hardening acceleration gas containing oxygen is introduced into the processing chamber 1 thus increasing the viscosity of the thin film R. Thereafter, gas supply is stopped and the processing chamber 1 is evacuated again thus removing the hardening acceleration gas and inhibiting progress of hardening. Under this state, the thin film R on the sheet film F and a substrate W are brought into tight contact and pressurized thus transferring the thin film R to the substrate W. <P>COPYRIGHT: (C)2013,JPO&INPIT |
