EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR FOR EPITAXIAL PROCESS

摘要

According to one embodiment of the present invention, equipment for manufacturing a semiconductor comprises: a cleansing chamber in which a cleansing of a substrate takes place; an epitaxial chamber in which an epitaxial process of forming an epitaxial layer on the substrate takes place; and a transfer chamber, to a side of which the cleansing chamber and the epitaxial chamber are connected, comprising a substrate handler for transferring the substrate of which the cleansing process is completed to the epitaxial chamber, wherein the cleansing chamber comprises a reaction chamber, which is connected to a side of the transfer chamber and in which a reaction process with respect to the substrate takes place, and a heating chamber, which is connected to the side of the transfer chamber and in which a heating process with respect to the substrate takes place, wherein the reaction chamber and the heating chamber are loaded vertically.