| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a state change tracking method with which a locus of an actual state change can be represented approximately by removing a sample error from time-series data relating to states such as process management, brain wave, body temperature and the like, a process management supporting apparatus using the state change tracking method and a process management supporting method. <P>SOLUTION: A process management supporting apparatus comprises: a process management unit 11 which creates a management chart; a database unit 21 which stores manufacture environments/manufacture conditions; a state change tracking unit 31 which calculates a locus of a process state according to a state change tracking method; a cause investigation support unit 41 which extracts data relating to the manufacture environments/manufacture conditions before and after a change point from the database unit 21 when the presence of a change in a process state is determined; and an output screen creation unit 51 which creates a screen on which the management chart is associated with the locus of the process state. When there is a change in the process state, the output screen creation unit 51 creates a screen which outputs the manufacture environments/manufacture conditions before and after the change point in association with the change point of the process state. <P>COPYRIGHT: (C)2013,JPO&INPIT |
