发明名称 |
ELECTRON BEAM APPARATUS AND A DEVICE MANUFACTURING METHOD BY USING SAID ELECTRON BEAM APPARATUS |
摘要 |
An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
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申请公布号 |
US2013032716(A1) |
申请公布日期 |
2013.02.07 |
申请号 |
US20080007511 |
申请日期 |
2008.01.11 |
申请人 |
EBARA CORPORATION;NAKASUJI MAMORU;KATO TAKAO;NOJI NOBUHARU;SATAKE TOHRU;MURAKAMI TAKESHI;WATANABE KENJI |
发明人 |
NAKASUJI MAMORU;KATO TAKAO;NOJI NOBUHARU;SATAKE TOHRU;MURAKAMI TAKESHI;WATANABE KENJI |
分类号 |
H01J37/07;G01N23/225;H01J3/02;H01J3/10;H01J37/04;H01J37/06;H01J37/063;H01J37/073;H01J37/12;H01J37/147;H01J37/28;H01J37/317;H01L21/66 |
主分类号 |
H01J37/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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