| 摘要 |
A vapor chamber capillary formation method includes providing a base plate and a corresponding cover plate; forming a plurality of support protrusions on the base plate or any internal wall of the cover plate directly; coating a capillary structure onto a surface of the support protrusions, an internal wall of the base plate, and an internal wall of the cover plate; stacking and sealing the base plate and the cover plate with one another to form a cavity; and filling a working fluid into the cavity, and vacuuming and sealing the cavity. In addition, a vapor chamber capillary structure is further disclosed, and the structure can be formed on an internal wall of a casing of the vapor chamber directly, and the support strength and the yield rate of the vapor chamber can be enhanced.
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