APPARATUS AND METHOD FOR TREATING SUBSTRATE

摘要

PURPOSE: An apparatus for processing a substrate and a method thereof are provided to improve a throughput by vertically arranging a process chamber. CONSTITUTION: A housing(4100) provides a process space for a high pressure process. A housing has an opening(4110) for moving a substrate. A supporting member is installed in the housing to support the substrate. A pressurization member(4200) pressurizes a door to close the housing in the high pressure process. A link is combined with the housing and the door. The door is guided.