发明名称 |
SILANE-BASED COMPOUNDS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME |
摘要 |
The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.
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申请公布号 |
US2013034814(A1) |
申请公布日期 |
2013.02.07 |
申请号 |
US201213566434 |
申请日期 |
2012.08.03 |
申请人 |
LG CHEM, LTD.;CHO CHANGHO;HEO YOON HEE;KIM SUNGHYUN;KIM HAN SOO;KIM SUNHWA;CHUNG WON JIN |
发明人 |
CHO CHANGHO;HEO YOON HEE;KIM SUNGHYUN;KIM HAN SOO;KIM SUNHWA;CHUNG WON JIN |
分类号 |
C07F7/18;G02B5/23;G03F7/075;G03F7/20 |
主分类号 |
C07F7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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