发明名称 SILANE-BASED COMPOUNDS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
摘要 The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.
申请公布号 US2013034814(A1) 申请公布日期 2013.02.07
申请号 US201213566434 申请日期 2012.08.03
申请人 LG CHEM, LTD.;CHO CHANGHO;HEO YOON HEE;KIM SUNGHYUN;KIM HAN SOO;KIM SUNHWA;CHUNG WON JIN 发明人 CHO CHANGHO;HEO YOON HEE;KIM SUNGHYUN;KIM HAN SOO;KIM SUNHWA;CHUNG WON JIN
分类号 C07F7/18;G02B5/23;G03F7/075;G03F7/20 主分类号 C07F7/18
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