发明名称 |
ETCHING COMPOSITION, METHOD OF FORMING A METAL PATTERN USING THE ETCHING COMPOSITION, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE |
摘要 |
An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.
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申请公布号 |
US2013034923(A1) |
申请公布日期 |
2013.02.07 |
申请号 |
US201213433013 |
申请日期 |
2012.03.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD.;KIM IN-BAE;CHOUNG JONG-HYUN;PARK JI-YOUNG;KIM SEON-IL;JEONG JAE-WOO;KIM SANG GAB;KIM SANG-WOO;LEE KI-BEOM;LEE DAE-WOO;CHO SAM-YOUNG |
发明人 |
KIM IN-BAE;CHOUNG JONG-HYUN;PARK JI-YOUNG;KIM SEON-IL;JEONG JAE-WOO;KIM SANG GAB;KIM SANG-WOO;LEE KI-BEOM;LEE DAE-WOO;CHO SAM-YOUNG |
分类号 |
H01L33/08;C09K13/00;C09K13/08;C23F1/02 |
主分类号 |
H01L33/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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