| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film having excellent gas barrier properties (particularly, water vapor barrier properties) and a device using the film. <P>SOLUTION: The film having excellent gas barrier properties is obtained by forming a vapor deposition layer 3 of aluminum oxide having the following properties (1)and/or (2) on at least one side of a base material film in at least a part thereof in the thickness direction while interposing an anchor layer 2 therebetween. The property (1) is that a peak of the composition ratio (y/x) of the aluminum oxide (AlxOy) exists within 2.1-3.0 and the property (2) is that the density of the aluminum oxide is ≥3.4 g/cm<SP POS="POST">3</SP>. <P>COPYRIGHT: (C)2013,JPO&INPIT |
