| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a target for CuGaNa-based spattering, high in relative density and small in variation of a resistance value, and to provide a method of manufacturing the same. <P>SOLUTION: This method of manufacturing the target for the CuGaNa-based spattering includes: producing the mixed powder of CuGa alloy powder and NaCI powder having an average grain size of 100 μm or smaller; and pressurizing and sinters the mixed powder. By employing the NaCI powder as an Na raw material added to the CuGa alloy powder, and by limiting the average grain size of the NaCI powder to 100 μm or smaller, the relative density of a sintered body can be raised to, for example, 97% or higher, and the variation of the resistance value can be reduced to, for example, ±10% or smaller. <P>COPYRIGHT: (C)2013,JPO&INPIT |
