| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cyanoadamantyl compound, a polymer, and a photoresist containing the polymer. <P>SOLUTION: A cyanoadamantyl compound, a polymer containing the polymerization units of the compound, and a photoresist composition containing the polymer are disclosed. A preferable polymer is used in photoresists that form images by means of wavelengths shorter than 250 nm, such as 248 nm and 193 nm. <P>COPYRIGHT: (C)2013,JPO&INPIT |
