发明名称 METHOD OF MANUFACTURING POWER DEVICE
摘要 A method of manufacturing a power device includes forming a first drift region on a substrate. A trench is formed by patterning the first drift region. A second drift region is formed by growing n-gallium nitride (GaN) in the trench, and alternately disposing the first drift region and the second drift region. A source electrode contact layer is formed on the second drift region. A source electrode and a gate electrode are formed on the source electrode contact layer. A drain electrode is formed on one side of the substrate which is an opposite side of the first drift region.
申请公布号 US2013034939(A1) 申请公布日期 2013.02.07
申请号 US201213550920 申请日期 2012.07.17
申请人 SAMSUNG ELECTRONICS CO., LTD.;LEE JAE HOON;KIM KI SE;LEE JUNG HEE;IM KI SIK;KIM DONG SEOK 发明人 LEE JAE HOON;KIM KI SE;LEE JUNG HEE;IM KI SIK;KIM DONG SEOK
分类号 H01L21/336 主分类号 H01L21/336
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