发明名称 METHOD AND APPARATUS FOR IMPROVED WAFER SINGULATION
摘要 <p>Laser singulation of electronic devices from semiconductor substrates including wafers is performed using up to 3 lasers from 2 wavelength ranges. Using up to 3 lasers from 2 wavelength ranges permits laser singulation of wafers held by die attach film while avoiding problems caused by single-wavelength dicing. In particular, using up to 3 lasers from 2 wavelength ranges permits efficient dicing of semiconductor wafers while avoiding debris and thermal problems associated with laser processing die attach tape.</p>
申请公布号 KR20130014522(A) 申请公布日期 2013.02.07
申请号 KR20127024936 申请日期 2011.03.31
申请人 ELECTRO SCIENTIFIC INDUSTRIES, INC. 发明人 OSAKO YASU;CHO BONG;FINN DARAGH;HOOPER ANDREW;O'BRIEN JAMES
分类号 H01L21/301;B23K26/00 主分类号 H01L21/301
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