发明名称 |
METHOD AND APPARATUS FOR IMPROVED WAFER SINGULATION |
摘要 |
<p>Laser singulation of electronic devices from semiconductor substrates including wafers is performed using up to 3 lasers from 2 wavelength ranges. Using up to 3 lasers from 2 wavelength ranges permits laser singulation of wafers held by die attach film while avoiding problems caused by single-wavelength dicing. In particular, using up to 3 lasers from 2 wavelength ranges permits efficient dicing of semiconductor wafers while avoiding debris and thermal problems associated with laser processing die attach tape.</p> |
申请公布号 |
KR20130014522(A) |
申请公布日期 |
2013.02.07 |
申请号 |
KR20127024936 |
申请日期 |
2011.03.31 |
申请人 |
ELECTRO SCIENTIFIC INDUSTRIES, INC. |
发明人 |
OSAKO YASU;CHO BONG;FINN DARAGH;HOOPER ANDREW;O'BRIEN JAMES |
分类号 |
H01L21/301;B23K26/00 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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