| 摘要 |
<p>PURPOSE: A sputter apparatus is provided to improve the flux of a neutral particle beam moving to a substrate side to enhance a density of a deposition film deposited on the substrate by a neutral particle beam even when the substrate is not heated up. CONSTITUTION: A sputter apparatus comprises multiple targets(100), a reflector(200), a wave guide(300), and a limiter(400). The target has magnetism. The reflector having magnetism is positioned between targets adjacent to the multiple targets. The wave guide having magnetism is placed on the target and formed with a guide space guiding a microwave. The limiter having magnetism is placed on the wave guide to form an electron spin resonance area. The target spins on the target's own axis. The target includes a target body, which has a circular space formed inside and neighbors the electron spin resonance area, and a first magnetic body contacted with the target body to be placed in the circular space.</p> |
