发明名称 GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, MASK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREOF
摘要 A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1 between the edge portions of the adjacent pits is 50 μm or more. The marker is formed, for example, on an end face of the mask blank glass substrate.
申请公布号 KR101231423(B1) 申请公布日期 2013.02.07
申请号 KR20090053804 申请日期 2009.06.17
申请人 发明人
分类号 C03C23/00;G03F1/50;G03F1/60;H01L21/027 主分类号 C03C23/00
代理机构 代理人
主权项
地址