发明名称 POSITION MEASUREMENT APPARATUS AND POSITION MEASURING METHOD
摘要 <p>PURPOSE: A position measuring device and a position measuring method are provided to measure the length of a measurement object when a measurement range of the measurement object is smaller or larger than a photographing domain while preventing the device from becoming larger and increasing the manufacturing cost. CONSTITUTION: A position measuring method is as follows. A surface of a workpiece is photographed while relatively moving a photographing element(50) and having a size smaller than the workpiece on the surface of the workpiece. A shape of a surface phase of the workpiece is extracted from the images of the photographing domain. The displacement of the shape generated in the images of the photographing domain is detected. A position of the surface phase of the workpiece is measured by using the detected displacement and the size. [Reference numerals] (18) Upper controller; (34) Lighting unit; (38,54) Communication unit; (40) Sensor head controller; (50) Photographing element; (52) Signal processor; (60) Operation unit; (62) Display; (64,66) External communication unit; (68) Controller; (70) Image memory; (74) Extracting unit; (75) Determining unit; (76) Detecting unit; (77) Calculating unit; (78) Measuring unit</p>
申请公布号 KR20130014466(A) 申请公布日期 2013.02.07
申请号 KR20120149649 申请日期 2012.12.20
申请人 SMC CORPORATION 发明人 AKI TOMOHIKO
分类号 G01B11/00 主分类号 G01B11/00
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