Asymmetric Source-Drain Field Effect Transistor and Method of Making

摘要

The present invention is related to microelectronic device technologies. A method for making an asymmetric source-drain field-effect transistor is disclosed. A unique asymmetric source-drain field-effect transistor structure is formed by changing ion implantation tilt angles to control the locations of doped regions formed by two ion implantation processes. The asymmetric source-drain field-effect transistor has structurally asymmetric source/drain regions, one of which is formed of a P-N junction while the other one being formed of a mixed junction, the mixed junction being a mixture of a Schottky junction and a P-N junction.