发明名称 MANUFACTURING METHOD OF MICROLENS AND MASK FOR EXPOSURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of microlenses provided on a solid state image sensor so that a high focusing performance is given by narrowing the gap to an adjoining microlens, and each microlens has a uniform shape. <P>SOLUTION: The manufacturing method of microlenses 7 in a solid state image sensor 10 comprises a step for providing a first layer 81 composing the microlenses, laminating a second layer 85 composing the microlenses on the first layer in a shape different from that of the first layer, and forming the microlenses of desired shape by integrating both layers by heat treatment. The first layer has a shape including a radial pattern from the center of each pixel toward the pixel boundary, and the second layer has a shape close to the polygonal shape of each pixel in a convex figure pattern not exceeding the pixel boundary. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013030666(A) 申请公布日期 2013.02.07
申请号 JP20110166663 申请日期 2011.07.29
申请人 TOPPAN PRINTING CO LTD 发明人 NAKAJIMA HIROMI
分类号 H01L27/14;G02B3/00;H04N5/369 主分类号 H01L27/14
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