发明名称 WAFER PROCESSING LAMINATE, WAFER PROCESSING MEMBER, TEMPORARY BONDING ARRANGEMENT, AND THIN WAFER MANUFACTURING METHOD
摘要 PURPOSE: A wafer processing laminate, a wafer processing member, a temporary bonding arrangement and a method for manufacturing a thin wafer are provided to improve productivity by using a uniform thickness adhesive layer. CONSTITUTION: An adhesive layer(3) is formed on a supporter(2). A wafer is laminated on the adhesive layer. The adhesive layer includes a first adhesive layer and a second adhesive layer. The first adhesive layer is made of thermoplastic organopolysiloxane polymer(A) which can be peeled off the surface of the wafer. The second adhesive layer is laminated on the first adhesive layer. The second adhesive layer is made of thermoplastic siloxane polymer(B) which can be peeled off the supporter.
申请公布号 KR20130014038(A) 申请公布日期 2013.02.06
申请号 KR20120082519 申请日期 2012.07.27
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KATO HIDETO;SUGO MICHIHIRO;TAGAMI SHOHEI
分类号 H01L21/20;H01L21/02 主分类号 H01L21/20
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