| 摘要 |
PURPOSE:To obtain a photosensitive polymer material superior in micropattern forming ability, transparency, heat resistance, water and solvent resistance, etc. by polymerizing a specified benzalacetophenone compound and glycidyl methacrylate. CONSTITUTION:5-80mol% benzalacetophenone compd., such as 4-methacryloyl- oxybenzalacetophenone and 95-20mol% glycidyl methacrylate are radically copolymerized in a solvent, such as cyclohexanone, in the presence of polymn. initiator, such as benzoyl peroxide, at normal temp. -100 deg.C for 30min- several days to produce a photosensitive polymer material of a random copolymer having 300-3000 polymn. degree composed of a building block of formula I (A is formula II or III, and R is H, methyl, or methoxy) and a building block of formula IV. This material is dissolved in a solvent, such as xylene, applied to a support, and exposed to light of <=400nm wavelength. |
