发明名称 HORIZONTAL EQUIPMENT FOR PLASMA THERMAL SPRAY AND HORIZONTAL PLASMA THERMAL SPRAYING METHOD THEREBY
摘要 PURPOSE: A horizontal plasma thermal spraying device capable of easily making a necessary atmosphere for a spraying work and a horizontal plasma spraying method using the same are provided to horizontally arrange a substrate, thereby moving a plasma gun in a horizontal direction of the horizontally arranged substrate. CONSTITUTION: A chamber(12) has an openable and sealable structure. A support structure(30) is arranged inside the chamber. The support structure horizontally supports a substrate loaded on the top. A transfer rail(28) is extended to a first axial direction on the top of the support structure. A first axial direction guide rail(18) is horizontally arranged in parallel at the both sides inside the chamber. A first axial direction LM block(20) is combined to the top of the first axial direction guide rail. A second axial direction guide rail(22) is extended to the second axial direction at the first axial direction LM block of the both sides intersecting the axis line of a first direction guide rail. A second axis direction LM block(24) is combined to the top of the second axial direction guide rail. A spraying nozzle spraying a plasma arc includes a plasma gun(26).
申请公布号 KR20130013345(A) 申请公布日期 2013.02.06
申请号 KR20110074938 申请日期 2011.07.28
申请人 YMC CO., LTD. 发明人 GANG, SEONG HUN
分类号 H05H1/34;C23C4/12 主分类号 H05H1/34
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