| 摘要 |
(1) A polymer compound for photoresist compositions which is high in storage stability and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided; and (3) a photoresist composition with improved LWR containing the subject polymer compound are further provided. In detail, [1] a tertiary alcohol derivative represented by the following general formula (1) is provided.
(In the formula, wherein R 1 represents a linear alkyl group having from 1 to 6 carbon atoms, a branched alkyl group having from 3 to 6 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms; R 2 represents a hydrogen atom or a methyl group; W represents a linear alkylene group having from 1 to 10 carbon atoms, a branched alkylene group having from 3 to 10 carbon atoms or a cyclic alkylene group having from 3 to 10 carbon atoms; n represents 0 or 1; and p represents 1 or 2.) |
