发明名称 LIQUID-GAS INTERFACE PLASMA DEVICE
摘要 <p>A plasma system for treating a workpiece is disclosed. The plasma system includes: a plasma device including an electrode formed from a metal alloy and a dielectric layer covering the electrode, the dielectric layer including a distal portion extending distally past a distal end of the electrode by a predetermined distance; a liquid source configured to supply a liquid to a workpiece; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the electrode and configured to ignite the ionizable media at the plasma device to form a plasma effluent in the presence of the liquid, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts with the workpiece.</p>
申请公布号 EP2554028(A1) 申请公布日期 2013.02.06
申请号 EP20100849146 申请日期 2010.03.31
申请人 COLORADO STATE UNIVERSITY RESEARCH FOUNDATION 发明人 KOO, IL-GYO;COLLINS, GEORGE J.
分类号 H05H1/24;H05H1/42 主分类号 H05H1/24
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