发明名称 MAGNETIC TUNNEL JUNCTION STORAGE ELEMENT AND METHOD OF FABRICATING THE SAME
摘要 Methods for forming a magnetic tunnel junction (MTJ) storage element and MTJ storage elements formed are disclosed. The MTJ storage element includes a MTJ stack having a pinned layer stack, a barrier layer and a free layer. An adjusting layer is formed on the free layer, such that the free layer is protected from process related damages. A top electrode is formed on the adjusting layer and the adjusting layer and the free layer are etched utilizing the top electrode as a mask. A spacer layer is then formed, encapsulating the top electrode, the adjusting layer and the free layer. The spacer layer and the remaining portions of the MTJ stack are etched. A protective covering layer is deposited over the spacer layer and the MTJ stack.
申请公布号 EP2553742(A1) 申请公布日期 2013.02.06
申请号 EP20110712737 申请日期 2011.03.25
申请人 QUALCOMM INCORPORATED 发明人 CHEN, WEI-CHUAN;KANG, SEUNG H.
分类号 H01L43/08;H01L27/22;H01L43/12 主分类号 H01L43/08
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