| 摘要 |
PURPOSE:To form a uniform resist film by removing bubbles in a resist liquid by utilizing the difference of specific gravity. CONSTITUTION:A resist liquid is stored in a vessel 1, and a pump 2, a defoaming tank 3 and a nozzle 4 are connected to the vessel 1 in succession by a duct 5. A semiconductor wafer 8 is sucked and positioned to a chuck 7 mounted to a shaft for a motor 6 in the lower section of the nozzle 4. A bung hole 3c is connected to the pump 2 in a side wall between a takeoff port 3a and the defoaming port 3b in order to inject the resist liquid into the defoaming tank 3 in the defoaming tank 3. Bubbles into which the resist liquid injected into the defoaming tank 3 from the bung hole 3c is mixed rise in the resist liquid during the time when they are stored, and are discharged from the defoaming port 3b. There is not bubble in the resist liquid dropped from the nozzle 4, thus forming a uniform resist film.
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