| 摘要 |
PURPOSE:To correct the inclination of a reticle setting base to a horizontal attitude by mounting a plurality of height adjusting mechanisms supporting a base plate for a reticle by at least three-point support. CONSTITUTION:A reticle 1 is placed on a base 2, positioning in the front and rear and left and right and rotational directions is conducted, and the reticle 1 is fixed onto the base 2 by a vacuum chuck. A semiconductor substrate 6 for a test on a stage 7 on which a photo-resist is applied is test-exposed by beams passed through a reduction projection lens 5 through the reticle 1, and a mounting attitude to the horizontal plane of the reticle 1 is investigated. The reticle setting base is corrected by using a height adjusting mechanism 4 on the basis of the measured value. Accordingly, the height adjusting mechanism 4 is driven separately on the basis of drive controlled variables corresponding to inclinations to the horizontal plane of the reticle by a control section 8, the positions of the height of each support point of the base 2 are regulated, the movements of the support points are measured by sensors 3 for measuring distances, and attitudes to the horizontal plane of the reticle are corrected, controlling the drive of the height adjusting mechanism 4 by the measured values.
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