发明名称 Rapid patterning of nanostructures
摘要 A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.
申请公布号 US8367525(B2) 申请公布日期 2013.02.05
申请号 US20100692610 申请日期 2010.01.23
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY;JACOBSON JOSEPH M.;JOO JAE-BUM;VARSANIK JON;AGNIHOTRI VIKRANT 发明人 JACOBSON JOSEPH M.;JOO JAE-BUM;VARSANIK JON;AGNIHOTRI VIKRANT
分类号 H01L21/20;H01L21/31 主分类号 H01L21/20
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