发明名称 Method of manufacturing magnetoresistive device and apparatus for manufacturing the same
摘要 A magnetoresistive device has an MgO (magnesium oxide) layer provided between a first ferromagnetic layer and a second ferromagnetic layer. The device is manufactured by forming a film of the MgO layer in a film forming chamber. A substance whose getter effect with respect to an oxidizing gas is large is adhered to surfaces of components provided in the chamber for forming the MgO layer. The substance having a large getter effect is a substance whose value of oxygen gas adsorption energy is 145 kcal/mol or higher. Ta (tantalum), in particular, is preferable as a substance which constitutes the magnetoresistive device.
申请公布号 US8367156(B2) 申请公布日期 2013.02.05
申请号 US201113177237 申请日期 2011.07.06
申请人 CANON ANELVA CORPORATION;NAGAMINE YOSHINORI;TSUNEKAWA KOJI;DJAYAPRAWIRA DAVID DJULIANTO;MAEHARA HIROKI 发明人 NAGAMINE YOSHINORI;TSUNEKAWA KOJI;DJAYAPRAWIRA DAVID DJULIANTO;MAEHARA HIROKI
分类号 B05D5/12 主分类号 B05D5/12
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