发明名称 |
Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same |
摘要 |
A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series comprising a plurality of gas processing units arranged in series on a gas flow channel; and a control section for controlling the operation of each unit of plasma equipment of the plasma equipment series. Each of the units of plasma equipment comprises a cavity composed of an electrical conductor and communicated with the gas flow channel; a plasma generator for generating plasma within the cavity; and microwave radiator for radiating microwaves to the plasma generated by the plasma starting section. The control section selects the number of units of plasma equipment to operate according to a component of the introduced gas. |
申请公布号 |
US8367005(B2) |
申请公布日期 |
2013.02.05 |
申请号 |
US20080668852 |
申请日期 |
2008.07.12 |
申请人 |
IMAGINEERING, INC.;IKEDA YUJI;MAKITA SHINOBU |
发明人 |
IKEDA YUJI;MAKITA SHINOBU |
分类号 |
H05H1/00;B01J19/12;G05B1/00;G05B15/00;H05H1/24 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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