发明名称 Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same
摘要 A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series comprising a plurality of gas processing units arranged in series on a gas flow channel; and a control section for controlling the operation of each unit of plasma equipment of the plasma equipment series. Each of the units of plasma equipment comprises a cavity composed of an electrical conductor and communicated with the gas flow channel; a plasma generator for generating plasma within the cavity; and microwave radiator for radiating microwaves to the plasma generated by the plasma starting section. The control section selects the number of units of plasma equipment to operate according to a component of the introduced gas.
申请公布号 US8367005(B2) 申请公布日期 2013.02.05
申请号 US20080668852 申请日期 2008.07.12
申请人 IMAGINEERING, INC.;IKEDA YUJI;MAKITA SHINOBU 发明人 IKEDA YUJI;MAKITA SHINOBU
分类号 H05H1/00;B01J19/12;G05B1/00;G05B15/00;H05H1/24 主分类号 H05H1/00
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