发明名称 Method for preparing a semiconductor
摘要 The invention concerns a method for preparing a NIII-V semiconductor. According to the invention, the method includes at least one step of doping a semiconductor of general formula AlxGa1-xN, wherein the atomic number x represents the number between 0 and 1 with a p-type electron-accepting dopant, as well as a co-doping step with a codopant capable of modifying the structure of the valency band. The invention also concerns a semiconductor as well as its use in electronics or optoelectronics. The invention further concerns a device as well as a diode using such a semiconductor.
申请公布号 US8367529(B2) 申请公布日期 2013.02.05
申请号 US20070281332 申请日期 2007.03.06
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS);DAUDIN BRUNO;MARIETTE HENRI 发明人 DAUDIN BRUNO;MARIETTE HENRI
分类号 H01L33/30;H01L33/32 主分类号 H01L33/30
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