发明名称 |
Processing apparatus and processing method |
摘要 |
A processing apparatus includes a process container having a placing table for placing a processing object, an exhaust system having vacuum pumps and a pressure control valve for exhausting atmosphere in the process container. A gas injection unit having a gas ejection hole is provided in the process container, as well as a gas supplying unit for supplying a process gas to the gas injection unit. The entire process apparatus is controlled by a controlling unit. The control unit controls the exhaust system and the gas supplying unit. When starting a predetermined process, the process gas at a flow rate greater than a prescribed flow rate is supplied for a short time while exhausting the atmosphere in the process container by the exhaust system, and then the process gas at a prescribed flow rate is supplied.
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申请公布号 |
US8366869(B2) |
申请公布日期 |
2013.02.05 |
申请号 |
US20070226089 |
申请日期 |
2007.04.06 |
申请人 |
TOKYO ELECTRON LIMITED;NOZAWA TOSHIHISA;KOTANI KOJI;TANAKA KOUJI |
发明人 |
NOZAWA TOSHIHISA;KOTANI KOJI;TANAKA KOUJI |
分类号 |
C23F1/00;C23C16/06;C23C16/22;C23C16/455;C23C16/52;H01L21/306 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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