发明名称 Liquid-ejection head and method for manufacturing liquid-ejection head substrate
摘要 A method for manufacturing a liquid-ejection head substrate including a silicon substrate having a supply port for supplying liquid is provided. The method includes: forming an etching mask layer on a surface of the silicon substrate, the etching mask layer having an opening in a portion corresponding to the supply port; forming a first recess in the surface of the silicon substrate by anisotropically etching the silicon substrate through the opening in the etching mask layer; forming a second recess that extends toward the other surface of the silicon substrate, in a surface of the first recess in the silicon substrate; and forming the supply port by anisotropically etching the silicon substrate from the surface provided with the second recess.
申请公布号 US8366950(B2) 申请公布日期 2013.02.05
申请号 US20080204802 申请日期 2008.09.05
申请人 CANON KABUSHIKI KAISHA;CHIDA MITSURU;SAKAI TOSHIYASU;OZAKI NORIYASU;ABO HIROYUKI;ABE KAZUYA;ONO KENJI 发明人 CHIDA MITSURU;SAKAI TOSHIYASU;OZAKI NORIYASU;ABO HIROYUKI;ABE KAZUYA;ONO KENJI
分类号 G01D15/00 主分类号 G01D15/00
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