发明名称 |
Liquid-ejection head and method for manufacturing liquid-ejection head substrate |
摘要 |
A method for manufacturing a liquid-ejection head substrate including a silicon substrate having a supply port for supplying liquid is provided. The method includes: forming an etching mask layer on a surface of the silicon substrate, the etching mask layer having an opening in a portion corresponding to the supply port; forming a first recess in the surface of the silicon substrate by anisotropically etching the silicon substrate through the opening in the etching mask layer; forming a second recess that extends toward the other surface of the silicon substrate, in a surface of the first recess in the silicon substrate; and forming the supply port by anisotropically etching the silicon substrate from the surface provided with the second recess.
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申请公布号 |
US8366950(B2) |
申请公布日期 |
2013.02.05 |
申请号 |
US20080204802 |
申请日期 |
2008.09.05 |
申请人 |
CANON KABUSHIKI KAISHA;CHIDA MITSURU;SAKAI TOSHIYASU;OZAKI NORIYASU;ABO HIROYUKI;ABE KAZUYA;ONO KENJI |
发明人 |
CHIDA MITSURU;SAKAI TOSHIYASU;OZAKI NORIYASU;ABO HIROYUKI;ABE KAZUYA;ONO KENJI |
分类号 |
G01D15/00 |
主分类号 |
G01D15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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