发明名称 Carbon phenolic ablative gap filler
摘要 A robust, chemically, structurally, and thermodynamically compatible ablative gap filler that can be processed with ease is provided. The gap filler uses a carbon phenolic mixture that has nearly the same material property characteristics as the adjacent PICA or carbon phenolic tiles. The gap filler is applied into the gaps using an innovative processing approach that involves preparation of a dry mixture of the ingredients, which is then packed manually or robotically (if needed) into the gaps. During the packing process, the dry mixture may be vented, and pressed periodically to ensure that there are no trapped voids. After each gap is adequately filled with the mixture, the assembly is bagged and cured in the oven at about 250 or 300° F. for about 1.5 to 2 hours. The gap filler thereby forms a bond with the adjacent PICA or carbon phenolic tiles, without degrading or modifying the properties at any of the interfaces (e.g., with the tiles, adhesives, substrate, etc.).
申请公布号 US8367178(B1) 申请公布日期 2013.02.05
申请号 US20100704793 申请日期 2010.02.12
申请人 LOCKHEED MARTIN CORPORATION;RAWAL SURAJ P.;WILLCOCKSON WILLIAM H.;HUND RICHARD A. 发明人 RAWAL SURAJ P.;WILLCOCKSON WILLIAM H.;HUND RICHARD A.
分类号 B32B3/10;B32B3/12 主分类号 B32B3/10
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