发明名称 |
EUV light source glint reduction system |
摘要 |
An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a portion of an internal surface of the chamber and configured to reduce a flow of light at the source wavelength from the internal surface back along the beam path.
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申请公布号 |
US8368039(B2) |
申请公布日期 |
2013.02.05 |
申请号 |
US20100753938 |
申请日期 |
2010.04.05 |
申请人 |
CYMER, INC.;GOVINDARAJU ABHIRAM;PARTLO WILLIAM N. |
发明人 |
GOVINDARAJU ABHIRAM;PARTLO WILLIAM N. |
分类号 |
G01J3/10 |
主分类号 |
G01J3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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