发明名称 |
Charged particle beam exposure system and beam manipulating arrangement |
摘要 |
A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.
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申请公布号 |
US8368030(B2) |
申请公布日期 |
2013.02.05 |
申请号 |
US20060988922 |
申请日期 |
2006.07.20 |
申请人 |
CARL ZEISS SMS GMBH;PLATZGUMMER ELMAR;STENGL GERHARD |
发明人 |
PLATZGUMMER ELMAR;STENGL GERHARD |
分类号 |
G21K5/04 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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