发明名称 Antifuse structure for in line circuit modification
摘要 An antifuse structure and methods of forming contacts within the antifuse structure. The antifuse structure includes a substrate having an overlying metal layer, a dielectric layer formed on an upper surface of the metal layer, and a contact formed of contact material within a contact via etched through the dielectric layer into the metal layer. The contact via includes a metal material at a bottom surface of the contact via and an untreated or partially treated metal precursor on top of the metal material.
申请公布号 US8367483(B2) 申请公布日期 2013.02.05
申请号 US201213360203 申请日期 2012.01.27
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;KANE TERENCE L.;TENNEY MICHAEL P.;WANG YUN-YU;WONG KEITH KWONG HON 发明人 KANE TERENCE L.;TENNEY MICHAEL P.;WANG YUN-YU;WONG KEITH KWONG HON
分类号 H01L21/82 主分类号 H01L21/82
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