发明名称 |
Method of exposing substrate, apparatus for performing the same, and method of manufacturing display substrate using the same |
摘要 |
A photoresist layer exposed through first slits of a mask is exposed using first light. The photoresist layer exposed through second slits of the mask is exposed by using second light. The first light passes thorough a transflective shutter to generate the second light.
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申请公布号 |
US8367281(B2) |
申请公布日期 |
2013.02.05 |
申请号 |
US20100778574 |
申请日期 |
2010.05.12 |
申请人 |
SAMSUNG DISPLAY CO., LTD.;AHN BO-KYOUNG;JO GUG-RAE;YOO HONG-SUK;KIM CHANG-HOON;KIM MIN-UK;BAE JOO-HAN |
发明人 |
AHN BO-KYOUNG;JO GUG-RAE;YOO HONG-SUK;KIM CHANG-HOON;KIM MIN-UK;BAE JOO-HAN |
分类号 |
G03F7/20;G02B5/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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