发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 <p>PURPOSE: A semiconductor IC(Integrated Circuit) is provided to prevent a PN junction portion from being broken which is formed between a guard ring region and a protecting element. CONSTITUTION: A first impurity region(N) has a rectangular structure. A guard ring(Grd Rng) has a ring structure surrounding the first impurity region. A weak spot(Wk SP) is formed in the short side of the first impurity region. A gate electrode(G) of a MOS transistor is formed between first impurity regions in a longitudinal direction. Both sides of the multiple first impurity regions function as a source(S) and a drain(D) of the MOS transistor.</p>
申请公布号 KR20130012565(A) 申请公布日期 2013.02.04
申请号 KR20120080824 申请日期 2012.07.24
申请人 RENESAS ELECTRONICS CORPORATION 发明人 YOSHIOKA AKIHIKO
分类号 H01L27/04;H01L21/336;H01L21/8238;H01L29/78 主分类号 H01L27/04
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