发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT |
摘要 |
<p>PURPOSE: A semiconductor IC(Integrated Circuit) is provided to prevent a PN junction portion from being broken which is formed between a guard ring region and a protecting element. CONSTITUTION: A first impurity region(N) has a rectangular structure. A guard ring(Grd Rng) has a ring structure surrounding the first impurity region. A weak spot(Wk SP) is formed in the short side of the first impurity region. A gate electrode(G) of a MOS transistor is formed between first impurity regions in a longitudinal direction. Both sides of the multiple first impurity regions function as a source(S) and a drain(D) of the MOS transistor.</p> |
申请公布号 |
KR20130012565(A) |
申请公布日期 |
2013.02.04 |
申请号 |
KR20120080824 |
申请日期 |
2012.07.24 |
申请人 |
RENESAS ELECTRONICS CORPORATION |
发明人 |
YOSHIOKA AKIHIKO |
分类号 |
H01L27/04;H01L21/336;H01L21/8238;H01L29/78 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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