| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a temperature adjusting mask and a method for adjusting temperature of a charged particle beam lithography apparatus in which battery run-out during temperature measurement in a chamber is prevented, the measurement under a situation similar to an actual drawing process is made possible, and the temperature adjustment in each chamber can be accurately performed. <P>SOLUTION: A temperature adjusting mask includes: a temperature measurement device 11 for measuring the temperature in a chamber constituting a charged particle beam lithography apparatus 1; a housing 12 in which the temperature measurement device 11 is housed; a plurality of batteries 13, 14 disposed on sides of the housing 12 opposite to each other; and a data transmission section 16 for transmitting temperature measurement data measured by the temperature measurement device 11. <P>COPYRIGHT: (C)2013,JPO&INPIT |
