发明名称 A method for manufacturing a semiconductor device, display device, and light-emitting device
摘要 A semiconductor device that has the structure that is capable of preventing moisture, oxygen, or the like, from outside from penetrating, in addition to the structure that is being thin, lightweight, flexible and having a curbed surface. In the present invention, the structure that is thin, lightweight, flexible, and that has a curved surface, moreover, that is capable of preventing moisture, oxygen, or the like, from outside from penetrating is realized by means that a structure is formed in which a device formation layer is covered by a fluoroplastic film and by means that TFTs included in a device formation layer is formed of an island-like semiconductor film.
申请公布号 KR101229249(B1) 申请公布日期 2013.02.04
申请号 KR20120035149 申请日期 2012.04.04
申请人 发明人
分类号 H01L29/786;G02F1/1362;H01L21/312;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L51/52;H01L51/56;H05B33/04 主分类号 H01L29/786
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