| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor phase growth apparatus which enables deposition of a compound semiconductor crystal having a stabilized quality on a processed substrate, by preventing warpage due to thermal expansion and temperature rise of a shower plate, thereby inhibiting the growth of a product on the shower plate. <P>SOLUTION: The shower plate for protecting a shower head consists of a plurality of stripe plates each having a plurality of plate holes, and the stripe plates are held slidably for the shower head. <P>COPYRIGHT: (C)2013,JPO&INPIT |
