| 摘要 |
<P>PROBLEM TO BE SOLVED: To precisely monitor a manufacturing process of a semiconductor device. <P>SOLUTION: An output waveform of a third sensor is formed from a waveform A1 which corresponds to a dynamic range of the sensor by a process according to a recipe. After that, a substrate is processed according to the recipe so that a waveform A2 caused by the process is formed. The waveform A2 is a signal having a noise level. By normalizing the output waveform of the third sensor, a signal at a noise level is prevented from being amplified. An operational state of a semiconductor manufacturing apparatus is monitored by performing multivariate analysis using data provided by normalizing output waveforms of a first sensor, a second sensor, and the third sensor, respectively. <P>COPYRIGHT: (C)2013,JPO&INPIT |
