发明名称 |
STAGE DEVICE AND PROCESS DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique capable of controlling a thickness distribution of a function material layer with high precision and in a short period of time. <P>SOLUTION: A stage device according to an embodiment comprises: a height control unit 12 arranged on a lower surface side of a substrate 13 to be processed and including a plurality of height control elements which are vertically driven; and a control unit 15 which controls the height control unit 12. The control unit 15 divides an upper surface of the substrate 13 to be processed into a plurality of areas, and sets a height of each of the areas independently by controlling a height of each of a plurality of height control elements on the basis of a data value. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013026233(A) |
申请公布日期 |
2013.02.04 |
申请号 |
JP20110156005 |
申请日期 |
2011.07.14 |
申请人 |
TOSHIBA CORP |
发明人 |
INENAMI RYOICHI;ITO SHINICHI;KOIZUMI HIROSHI;KOJIMA AKIHIRO |
分类号 |
H01L21/683;H01L21/027;H01L21/205;H01L21/31 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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