发明名称 |
FOCUS DETECTION APPARATUS FOR PROJECTION LITHOGRAPHY SYSTEM |
摘要 |
Disclosed is a focus detection apparatus for a projection lithography system. The apparatus comprises: a laser; a focus optical unit configured to focusing the emitted laser beam; a force detection unit configured to reflect the focused laser beam at the backside; a position detection unit configured to detect variations in position of a light spot formed by the reflected laser beam, and output a strength signal indicating the strength of the interaction force between the force detection unit and the object; a differential amplifier configured to output a Z-direction differential signal based on the strength signal and a reference signal; a Z-direction feedback control unit configured to perform feedback control; and a scan signal generator configured to output a signal for controlling the movement of the stage in the XY plane. The focus detection apparatus has high precision, efficiency and process applicability.
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申请公布号 |
US2013027679(A1) |
申请公布日期 |
2013.01.31 |
申请号 |
US201213464321 |
申请日期 |
2012.05.04 |
申请人 |
THE INSTITUTE OF OPTICS AND ELECTRONICS, THE CHINESE ACADEMY OF SCIENCES;LI JINLONG;HU SONG;ZHAO LIXIN;XU FENG;LI LANLAN;SHENG ZHUANG |
发明人 |
LI JINLONG;HU SONG;ZHAO LIXIN;XU FENG;LI LANLAN;SHENG ZHUANG |
分类号 |
G03B27/70 |
主分类号 |
G03B27/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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