发明名称 |
Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and Apparatus |
摘要 |
A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
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申请公布号 |
US2013025788(A1) |
申请公布日期 |
2013.01.31 |
申请号 |
US201213627696 |
申请日期 |
2012.09.26 |
申请人 |
SHAJII ALI;GOTTSCHO RICHARD;BENZERROUK SOUHEIL;COWE ANDREW;NAGARKATTI SIDDHARTH P.;ENTLEY WILLIAM |
发明人 |
SHAJII ALI;GOTTSCHO RICHARD;BENZERROUK SOUHEIL;COWE ANDREW;NAGARKATTI SIDDHARTH P.;ENTLEY WILLIAM |
分类号 |
H05H1/24;C23F1/08 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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