发明名称 Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and Apparatus
摘要 A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
申请公布号 US2013025788(A1) 申请公布日期 2013.01.31
申请号 US201213627696 申请日期 2012.09.26
申请人 SHAJII ALI;GOTTSCHO RICHARD;BENZERROUK SOUHEIL;COWE ANDREW;NAGARKATTI SIDDHARTH P.;ENTLEY WILLIAM 发明人 SHAJII ALI;GOTTSCHO RICHARD;BENZERROUK SOUHEIL;COWE ANDREW;NAGARKATTI SIDDHARTH P.;ENTLEY WILLIAM
分类号 H05H1/24;C23F1/08 主分类号 H05H1/24
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