发明名称 REACTANT DELIVERY SYSTEM FOR ALD/CVD PROCESSES
摘要 Provided are apparatus and methods for generating a chemical precursor. The apparatus comprises an inlet line to be connected to an ampoule and an outlet line to be connected to an ampoule. The inlet line having an inlet valve to control the flow of a carrier gas into the ampoule and the outlet line has an outlet valve to control the flow exiting the ampoule. A bypass valve allows carrier gas to bypass the ampoule and purge the outlet valve without flowing gas into the ampoule.
申请公布号 WO2013016208(A2) 申请公布日期 2013.01.31
申请号 WO2012US47641 申请日期 2012.07.20
申请人 APPLIED MATERIALS, INC.;CHOI, KENRIC;YUDOVSKY, JOSEPH;MARCUS, STEVEN D.;ULLOA, ERNESTO 发明人 CHOI, KENRIC;YUDOVSKY, JOSEPH;MARCUS, STEVEN D.;ULLOA, ERNESTO
分类号 H01L21/205;H01L21/02 主分类号 H01L21/205
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