FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the likelihood of bubble inclusion is at least reduced.

SOLUTION: A fluid handling structure for a lithographic apparatus comprises at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: meniscus pinning features to resist passage of the immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array. The plurality of gas supply openings at least partly surround one or more of the meniscus pinning features, and are placed radially outside of the meniscus pinning features. The plurality of gas supply openings in a linear array are of a similar or the same size.

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